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Site-Selective Epitaxy of Graphene on Si WafersFUKIDOME, Hirokazu; KAWAI, Yusuke; OTSUJI, Taiichi et al.Proceedings of the IEEE. 2013, Vol 101, Num 7, pp 1557-1566, issn 0018-9219, 10 p.Article

GaN Substrate Technologies for Optical DevicesNAKAMURA, Takao; MOTOKI, Kensaku.Proceedings of the IEEE. 2013, Vol 101, Num 10, pp 2221-2228, issn 0018-9219, 8 p.Article

Morphology evolution of epitaxial SiGe and Si in patternsSEISS, Birgit; DUTARTRE, Didier.Solid-state electronics. 2013, Vol 83, pp 18-24, issn 0038-1101, 7 p.Conference Paper

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